Method for depositing a nanometric thin film on a substrate

US-29979807-A
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(en)The invention concerns in particular a method for depositing a nanometric multilayer thin film on a substrate from a liquid solution containing at least one surfactant. The method includes the following steps: forming a film from the solution; contacting the substrate; and depositing the film on the substrate. The invention is particularly formed to enable depositing black films on different types of surfaces, in particular for obtaining highly organized films. The films obtained by the method are particularly useful in electronics and optics.

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